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    Chromium sputtering target, high purity, monolithic, rotatable, disc, HIP, planar, cathodic ARC, PVD coating, thin film deposition, magnetron Cr sputtering targets manufacturer and supplier
    CHROMIUM SPUTTERING TARGET
    Haohai offers high density, hot rolled Chromium sputtering targets of electrolytic Chromium refined to a purity up to 99.99% with a low content of oxygen and other gaseous impurities.
    Chromium and Chromium Nitride (CrN) made from Haohai’s Chromium sputtering targets is an excellent function and decorative coating that provides lubricity and superior wear and corrosion resistance. It has a very low residual stress, which provides for the best adhesion and ductility of any of the PVD coatings even as a bonding layer in DLC coatings (Diamond Like Carbon). It can applicate in automotive parts, molds and dies, pump parts, shafts, dry deep drawing and works especially well when used against copper.

    Decorative chromium coatings are applied using the magnetron sputtering method.
    Wear resistant and adhesive layers can also be produced using the arc evaporation method.

    Haohai Chromium sputtering targets include Chromium rotary sputtering targets, Chromium planar sputtering targets and Chromium cathodic targets.
    Chromium Rotary (Rotatable, Cylindrical) Sputtering Target
    Manufacturing Range
    OD (mm)ID (mm)Length (mm)Custom Made
    50 – 30030 – 280100 – 4000
    Specification
    CompositionCr
    Purity2N5 (99.5%), 2N8 (99.8%), 3N (99.9%), 3N5 (99.95%), 4N (99.99%)
    Density7.19 g/cm3
    Grain Sizes< 100 micron or on request
    Fabrication ProcessesVacuum Melting, HIP, Plasma Spraying, Machining, Bonding
    ShapeStraight, Dog bone
    End TypesSCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove,
    Custom Made for SS Backing Tube
    SurfaceRa 1.6 micron
    Other Specification
    ✦ Vapor degreased and demagnetized after final machining.
    ✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.
    ✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.
    ✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.
    Normal Sizes
    Chromium Rotary
    Sputtering TargetNormal SizesSS Backing Tubes
    55mm ID x 70mm OD x 1334mm Long
    80mm ID x 100mm OD x Long
    125mm ID x 153mm OD x 576mm Long
    125mm ID x 153mm OD x 800mm Long
    125mm ID x 153mm OD x 895mm Long
    125mm ID x 155mm OD x 895mm Long
    125mm ID x 153mm OD x 1172mm Long
    125mm ID x 153mm OD x 1676mm Long
    125mm ID x 153mm OD x 1940mm Long
    125mm ID x 153mm OD x 1994mm Long
    125mm ID x 153mm OD x 2420mm Long
    125mm ID x 153mm OD x 3191mm Long
    125mm ID x 153mm OD x 3852mm Long
    125mm ID x 153mm OD x Long
    125mm ID x 180mm OD x 624mm Long
    194mm ID x 219mm OD x 2301mm Long 80mm ID x 88.0mm OD x Long
    125mm ID x 133.0mm OD x 1940.0mm Long
    125mm ID x 132.5mm OD x 3200.4mm Long
    125mm ID x 132.5mm OD x Long

    Chromium Planar (rectangle, circular) Sputtering Target

    Manufacturing Range
    RectangleLength (mm)Width (mm)Thickness (mm)Custom Made
    10 – 200010 – 12001.0 – 50.8
    CircularDiameter (mm)
    Thickness (mm)
    10 – 1000
    1.0 – 100
    Specification
    CompositionCr
    Purity2N5 (99.5%), 2N8 (99.8%), 3N (99.9%), 3.5N (99.95%), 4N (99.99%)
    Density7.19 g/cm3
    Grain Sizes< 100 micron or on request
    Fabrication ProcessesVacuum Melting, HIP, Plasma Spraying, Machining, Bonding
    ShapePlate, Disc, Step, Custom Made
    TypesMonolithic, Multi-Segmented Target, Bonding
    SurfaceRa 1.6 micron
    Other Specifications
    Flatness, clean surface, polished, free of crack, oil, dot, etc.
    We monitor and control from the initial step – choose and mix powder, and then under the follow up process of shaping such as HIP, we make sure that our targets get the specific guaranteed density, purity and homogeneous microstructure, to provide our customer the best conditions to coat excellent thin films.
    Chromium Arc Cathodes
    We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets.
    For our Chromium Sputtering Target and Arc Cathodes
    Tolerance
    Acc. to drawings or on request.

    Impurities Content [ppm]
    Purity [%]
    99.9999.9599.899.5
    Metallic Impurities [ppm]Fe502008001000
    Si20100500700
    Other30100400500
    Non-Metallic Impurities [ppm]O10020010001200
    N20100200200
    C20100300300
    Guaranteed Density [g/cm3]7.157.157.127.12
    Grain Size [μm]100100100100
    Thermal Conductivity [W/(m.K)]max.260max.250max.150max.100
    Coefficient of Thermal Expansion [1/K]7.10-67.10-67.10-67.10-6
    Application
    ✦ Large Area Glass Coating (Low-E, Automotive)
    ✦ Display Inducstry
    ✦ Wear Resistant Coating
    ✦ Decorative Coating
    ✦ Optical Industry
    ✦ Solar & Photovoltaic Industry
    ✦ Magnetic Data Storage

    Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our chromium sputtering target, with high purity, include monolithic or spayed rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality chromium targets.Metal Sputtering Targets bonding
    website:http://www.pvdtarget.com/metal-sputtering-targets/